単一光源紫外光の波長選択利用と反応活性種による有機ガス状汚染物質の除去

抄録

A new-type of air purification reactor which can simultaneously remove gaseous contaminants and fine particles was developed and evaluated in this study. Two short wavelengths of UV light (185 nm and 254 nm) , irradiated from a single UV source, were separated with an optical filter and used respectively for the gas-to-particle photochemical conversion of organic gases and for the charging of particles generated with the UV/photoelectron method. This technique was applied to remove typical gaseous contaminants in clean rooms, low concentrations of di-n-butyl phthalate (DBP) , dioctyl phthalate (DOP) and low molecular-weight cyclosiloxane (LMCS) . The particles converted from their vapors were effectively removed by the UV/photoelectron method and trapped on an ozone-decomposition catalyst (ODC) , which was used to decompose O₃ formed by 185 nm UV irradiation. Furthermore, the effect of photocatalyst was also investigated for the decomposition of organic gaseous compounds under irradiation of short-wavelength UV light. It became clear that the photocatalyst contributed to promote the mineralization of intermediate products.