Abstract
In a cleanroom for manufacturing semiconductor, flat panel display, and hard disk drive, the contamination control of airborne molecular contaminants is of critical importance. One of the contamination control technologies for gaseous contaminants is chemical air filter. The purpose of this work is to study the monitoring of the chemical air filter life using quartz crystal microbalance (QCM) method. When a chemical air filter is in the early stages of adsorption, the QCM monitoring system used in this study could detect the differences in the concentration of total organic compounds at the inlet and outlet of the chemical air filter. The QCM monitoring system was found to be useful for evaluating the performance of chemical air filters in the prevention of surface contamination. The system could also detect the daily changes in the removal efficiency of high-boiling-point compounds by chemical air filters.
