日本マイクログラビティ応用学会誌
Print ISSN : 0915-3616
シアーセルによる半導体及び金属融液における高精度拡散係数の測定
依田 真一 織田 裕久大井田 俊彦正木 匡彦兼子 稔東野 和幸
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ジャーナル オープンアクセス

1999 年 16 巻 2 号 p. 111-

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Shear cell technology for high precise diffusion coefficient measurements was developed by using microgravity condition in MSL- 1. Two diffusion experiments with Sn and PbSnTe specimens were done in the mission. Excellent concentration profile was obtained in self-diffusion experiments of Sn by the shear cell technology developed for these experiments, whereas the PbSnTe experiment results were scattered. The reason for the scattering was ascribed to the facts that steeper tempera­ture gradient was formed in the cartridge under microgravity compared to that on ground. This steeper thermal gradient would enhance the transpiration of the vapor from the center to outer of the cartridge. Temperature dependence of diffusion in Sn was obtained with the data by Frohberg. The dependence was a little different from that obtained by Frohberg.
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© 1999 日本マイクログラビティ応用学会
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