Journal of the Ceramic Society of Japan
Online ISSN : 1348-6535
Print ISSN : 1882-0743
ISSN-L : 1348-6535
Technical reports
Ordering analysis of SiO2 particle-accumulated films by small-angle X-ray scattering
Kazutaka KamitaniAkira MiyanoKakeru NinomiyaMaiko Nishibori
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JOURNAL OPEN ACCESS

2023 Volume 131 Issue 4 Pages 112-115

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Abstract

The ordered arrangement of particles and holes in SiO2 particle-accumulated films by small-angle X-ray scattering (SAXS) was investigated. The SAXS profiles of SiO2 particles exhibited the typical oscillation shown by monodisperse spherical particles. On the other hand, the SAXS profile of the ordered SiO2 particle-accumulated film showed an additional oscillation suggesting that another scattering component existed except for SiO2 particles. Furthermore, considering two components: “SiO2 in an air matrix” and “air holes in a SiO2 matrix”, we successfully reproduced the SAXS profile of the ordered particle-accumulated film. The additional oscillation shows the existence of the tetrahedral holes, suggesting that this SiO2 particle-accumulated film forms a close-packed structure. The intensity of the additional oscillation increased with the regularity of the particle arrangement in the SiO2 particle-accumulating film. These results suggest that SAXS measurements using synchrotron radiation can provide information on the order of particle arrangement in composite films.

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© 2023 The Ceramic Society of Japan

この記事はクリエイティブ・コモンズ [表示 4.0 国際]ライセンスの下に提供されています。
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