Abstract
Auger Electron Spectroscopy (AES), X-ray Photoelectron Spectroscopy (XPS), and Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) are surface analysis techniques which provide atomic- and molecular-level surface chemical information. They are widely used for failure analysis, quality control, and research and development of advanced materials and devices. In this review, we overview the recent progress of the commercial apparatus, and also highlight their improved sensitivity and depth profiling capabilities. We also introduce their recent application in corrosion science.
