Corrosion Resistance of TiN Coating Deposited on Quartz by RF Plasma-Assisted CVD

Abstract

Anti-corrosion resistance of the coatings deposited by the Chemical Vapour Deposition (CVD) is considered to be influenced by the characteristics of the coatings, such as chemical composition, impurity, micro-pores, crystallographic orientation and so on. Study aims to examine the characteristics and corrosion resistance of titanium nitride coating deposited by Radio-Frequency (RF)-plasma CVD of TiCl₄+N₂+H₂ reactants. The corrosion resistance of the coating is found to be influenced by the deposition conditions such as the substrate temperature and N₂/TiCl₄ mixing ratio to a great extent. A highly crystalline stoichiometric TiN coating with excellent anti-corrosion resistance in acidified solution could be synthesized at the substrate temperature higher than 923K and N₂/TiCl₄ mixing ration of 3. This coating contains very few chlorine in it and low prefered crystallographic orientation.