Abstract
Secondary Ion Mass Spectrometry (SIMS) has been regarded as one of the most sensitive techniques for the three dimensional surface quantitative analysis. In this review article, general explanation is presented in concern with the principle of the measurements and data interpretations. Special emphases are laid on the quantification of the technique and the surface sensitivity when used as static SIMS. In addition, some examples are given for practical problem solving, especially for the evaluation of the various surface treatments of semiconductors, alloys and organic materials.
