The possibilities of Evaluation of the Teaching-Learning Process through the Skin Resistance Responce

Abstract

We researched the possibility of evaluation and analysis for the teaching-learning process through the skin resistance responce. We obtained the following results: 1. We found that the skin resistance responce is not present while children are concentrating and strong attentive to stimuli, however, for an orienting responce, the value of this resistance responce increases. This means that extreme high mean of skin resistance responce in class corresponds to orienting responce, and extreme low mean of this responce corresponds to concentrating and strong attentive to stimuli. 2. For the mean of middle area for skin resistance responce, we can utilize the proportion of principal component analysis for degree of children's resonance to teacher's activities. 3. We found that the distribution of generation for skin resistance responce is the Polya-Eggenberger distribution. So, for individual subject, we can utilize the positive of the coefficient of spread, which is the parameter of Polya-Eggenberger distribution, corresponds to concentration of attention. And we can utilize zero and negative of this parameter correspond to the spontaneous responce and the orienting responce respectively.