The surface X-ray diffraction method was started in mid 1980s and has been developed in tandem with synchrotron facility. It takes advantage of many characteristics of synchrotron x-ray, such as low emittance, high monochromaticity and high intensity. Many surface/interface phenomena involve atomic migration, whose characteristic time scale is on the order of millisecond or slower; therefore, time resolved measurement and coherent surface diffraction should be useful. The analysis of the surface diffraction requires high computational resource, thus development of software is also important. Recent development of surface x-ray diffraction technique in the world is summarized.