アルミニウムの陽極酸化皮膜に及ぼす加工条件の影響(第6報)

硫酸皮膜の交流電解における電解電圧及び電解液濃度の影響について

抄録

In the Part 1, Part 3 of this report, we discussed the effects of working-condition in direct current sulphuric acid process. Now, we shall develop our experiments into the region of alternating current sulphuric acid process. In this part, we report the effects of voltage and concentration of electrolyte. In this experiments, the current is A. C. only and the factors not examined are held in constant, i. e., temperature is 15±1°C. and time is 40 minutes. The inspection metrods for the properties of oxid film are themethods specified in JIS P 10431, 1951, which were used in the preceding experiments.
The results of experiments are as follows.
(1) The relation between thickness of film and voltage and concentration is shown by following experimental formula. (See Fig. 3, Fig. 4, Fig. 5, and Table 1.) T=1.6e^{(0.0052c0.829+0.032)v} [10<C<30 10<V<20 Time:40mins.] T=Thickness(μ)C=Concentration(%) V=Voltage(V)
(2) The relation between thickness of film and electric power is shown by following experimental formula. (See Fig. 6) T=1.8+0.35W/40mins. (10<V<20 0.5<A/dm²<1.8 Time:40mins.) W=A/dm2×V
(3) The relation between corrosion resistance and voltage and concentration is shown by following experimental formula formula. (See Fig. 7, Fig. 8, Fig. 9, Fig. 10 and Table 2.) S=(852e^0.030c)e^0.075v [10<C<25 10<V<20 Time:40mins.] S=Corrosion Resistance (Sec.)
(4) The relation between thickness of film and corrosion resistance is shown by following experimental formula. (see Fig, 11.) S=17.7T^0.633-10 [3<T<15]
(5) The relation between abrasion resistance and voltage and concentration is shown by following experimental formula. (See Fig. 12, Fig. 13, Fig. 14 and Table 3.) A=3.0e^{(0.127+0.049c)v} [10<C<30 10<V<20 Time: 40mins.] A=Abrasion Resistance (sec.)
(6) The relation between abrasion resistance and thickness of film is shown by following experimental formula. (See Fig. 16.) A=30T-100 [3<T<15]
(7) The relation between abrasion resistance and electric power is shown by following experimental formura. (See Fig. 16.) A=10W-50 [10<V<20 0.5<A/dm²<1.8 Time:40mins.]
(8) Specific abrasion resistances (abrasion resistance for unit thickness of film) are less than 1/2 of D. C. process. And then, maximum values of them change their place toward the dilute side of concentration as voltage rises. (See Fig. 15.)