Journal of the Japan Institute of Metals and Materials
Online ISSN : 1880-6880
Print ISSN : 0021-4876
ISSN-L : 0021-4876
Preparation of Fe-Ga Thin Films by DC Magnetron Sputtering
Mitsuaki TakeuchiYoshihito MatsumuraHirohisa Uchida
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2004 Volume 68 Issue 2 Pages 142-144

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Abstract

The magnetostrictive properties of Fe-Ga (Ga: 8 at%-21 at%) alloy films prepared by DC magnetron sputtering system were investigated. Base pressure was less than 1.0×10-4 Pa and Fe-Ga films were deposited onto Single crystal Si(100) and polyimide substrate at room temperature with DC 200 W in an Ar atmosphere of 2.5×10-1 Pa. The lattice parameter of Fe-Ga films with a bcc structure increased with the increasing Ga concentration. The Fe-Ga films showed columnar grains with a crystalline orientation for ‹110› perpendicular to the film plane. The magnetostriction of Fe-Ga films increased with the increasing Ga concentration. Fe-21 at%Ga film showed a maximum magnetostriction of 180 ppm at an applied magnetic field of 1200 kA/m.

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© 2004 The Japan Institute of Metals and Materials
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