Journal of the Japan Institute of Metals and Materials
Online ISSN : 1880-6880
Print ISSN : 0021-4876
ISSN-L : 0021-4876
Microstructures of Au-Ge and Au-Ge-Ni Eutectic Alloy Films Evaporated in Vacuum
Masahiro Kitada
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1973 Volume 37 Issue 11 Pages 1200-1206

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Abstract
Microstructures, morphology and electrical resistivity of Au-Ge and Au-Ge-Ni eutectic alloy films evaporated on the cleaved NaCl (100) substrate below the eutectic temperature are studied.
Au-12% Ge eutectic alloy films evaporated on the cleaved NaCl (100) show the structure composed of the matrix Au and the island-like Ge grains. The (111) planes of Au and Ge are parallel to the cleaved NaCl (100) surface, and the angles between ⟨110⟩ directions of Au and Ge are 3 to 10°. The average grain size of Ge in Au-12% Ge alloy films decreases with decreasing substrate temperature. The average grain size of Au in Au-Ge-Ni alloy films decrease with increasing concentration of Ni. The electrical resistivity of Au-Ge and Au-Ge-Ni alloy films increases with the increase in Ge or Ni concentration.
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