Journal of the Japan Institute of Metals and Materials
Online ISSN : 1880-6880
Print ISSN : 0021-4876
ISSN-L : 0021-4876
Diffusion Phenomenon at Cd2+/Au(100)Interface in Underpotential Deposition Region
Kimihiko KuboNobumitsu HiraiShigeta Hara
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2002 Volume 66 Issue 9 Pages 881-884

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Abstract

In our laboratory, diffusion phenomenon in underpotential deposition (UPD) region has been studied so far. The effects of anionic species, Cl and HSO4/SO42−, in electrolyte solution on the diffusion phenomenon were investigated by combining electrochemical measurements with in situ electrochemical atomic force microscope(EC-AFM) observation. It has been confirmed experimentally that the inward diffusion of Cd to the Au(100) substrate is promoted when Cl is present in electrolyte solution.

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