Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
In-Situ Observation of Thermal Behavior of Vacuum Deposited Al Films by Transmission Electron Microscopy
Shigeo SugawaraShunji Ishio
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1995 Volume 22 Issue 5 Pages 364-368

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Abstract
After preparing two kinds of epitaxial Al films by vacuum deposition on NaCl substrutes, we observed thermal behavior during heating in a transmission electron microscope. In (III) single-crystal films, many of local dislocations escaped from the films, and small grains shrinked and disappeared with rise in the temperature above 873K, resulting in the films with a better quality. In polycrystalline films with preferred (III) orientations, normal grain growth occurred with raising the temperature; thereafter, newly nucleated grains showed abormal growth along a heat flow to a larger extentin comparison with the normal growth at a temperature above 873K.
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© 1995 The Japanese Association for Crystal Growth
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