Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Observation of GaN Electron-Cyclotron-Resonance Molecular-Beam Epitaxy by Plasma Optical Emission Spectroscopy.
Y ChibaN UenishiY ShimizuT TominariY Nanishi
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1997 Volume 24 Issue 2 Pages 174-

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Abstract
Excited species near a substrate during GaN growth were observed by optical emission spectroscopy(OES)Both GaN growth rate and excited Ga emission intensity were studied varying substrate bias conditions. Decrease in Gaemission intensity in high positive bias condition can be explained by suppression of Ga desorption. Thus, OES is considered to be a useful tool to understand GaN growth mechanism in ECR plastna-excited MBE.
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© 1997 The Japanese Association for Crystal Growth
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