Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Tue Effect of Halide Film on the Secondary Growth of Cu Whiskers
Ryo DOMOTOKiyoshi KISHISadaharu JO
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1997 Volume 24 Issue 2 Pages 183-

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Abstract
Atomic force microscopy(AFM)reveals{111}thin layer of the charge halide salt or the transport agent nas Cover ne surface of CVD Cu whiskers. In the AFM images the hights are often enhanced many times. The caliculation shows introducing Coulomb's potential the enhanced hights of images can be interprited. The contamination of probe tip can cause a localized electric charge such as a Cu ion on the tip. Cu whiskers show only surfaces without any low-misfit interfaces with{111}halide surface. These surfaces are{100}for whiskers grown from CuCl or CuBr, and{110} for ones grown from CuI.
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© 1997 The Japanese Association for Crystal Growth
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