日本結晶成長学会誌
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
III族窒化物半導体のヘテロエピタキシー
赤崎 勇
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1997 年 24 巻 2 号 p. 199-202

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In spite of the large lattice mismatch between nitrides and sapphire, highquality nitride films have been successfully grown by using the low-temperature deposited AlN buffer layer. It is also found that nitride alloys are coherently grown even though the thickness exceeds critical layer thicknesses calculated from theories of Matthews and Blakeslee and Fischer et al.
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© 1997 日本結晶成長学会
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