Initial stage of vapor-deposited thin film formation of monoacylglycerols have been investigated by FT-IR and XRD and AFM. The FT-IR analysis have shown that growth hillocks having molecular axis normal to the surface (NGH) was predominant at low rate of deposition at high substrate temperature. AFM analysis showed that, in the first layer of NGH film, the step height was equal to monomer dimension. However, the step height of second and successive layers constructed of dimer molecules.
