Abstract
Stability of thin halide films observed on the surface of Cu microcrystals is studied by using molecular dynamics (MID) method. According to the AFM observations, thin {111}α-Cul film freezes epitaxially from the melt at 923K, 67K above the melting point, on Cu {110}, suggesting that the presence of the film forms {110} and blocks the formation of {111} surfaces on Cu.
