日本結晶成長学会誌
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
昇華法によるGaN単結晶育成(<小特集>バルク窒化物半導体)
西野 克志酒井 士郎
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1998 年 25 巻 4 号 p. 157-162

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A bulk GaN and a 'Quasi bulk' crystal which was selectively grown on a SiO_2-patterned GaN substrate were successfully obtained by a sublimation method. The source powder used in the growth was analyzed to show that the contributing species to the growth were the compounds composed of Ga, N and H. Characterization by X-ray diffraction, transmission electron microscopy, secondary ion mass spectrometry, and so on, demonstrated that a bulk GaN was of high quality.
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© 1998 日本結晶成長学会
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