Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
22aB9 Homoepitaxial srowth of high-quality ZnS films
S. NakamuraT AndoS TanakaY YamadaY Taguchi
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1999 Volume 26 Issue 2 Pages 28-

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Abstract
High-quality ZnS homoepitaxial films have been grown by low-pressure metalorganic chemical vapor deposition (MOCVD) on ZnS hulk substrates prepared by an iodine-transport method. Photoluminescence spectra of the ZnS homoepitaxial films at 4.2 K were dominated by the radiative recombination of excitonic transitions. In addition,the homoepitaxial growth of ZnS by molecular beam epitaxy (MBE) was performed on MOCVD-grown ZnS thick films. It was found that the contamination of residual impurity was much reduced in the ZnS homoepitaxial films grown by MBE.
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© 1999 The Japanese Association for Crystal Growth
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