Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Numerical study on the oxygen transport phenomena from silica to silicon melt
S. SakaiX. HuangK. HoshikawaY. Okano
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2000 Volume 27 Issue 1 Pages 9-

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Abstract
In order to investigate the oxygen transport phenomena from silica glass to silicon melt, numerical simulation based on the drop experiment has been carried out. In this analysis, the chemical reaction and diffusion transport phenomena at the free surface of silicon drop were considered, and the effect of the magnetic field on the oxygen transport was also examined.
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© 2000 The Japanese Association for Crystal Growth
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