Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Thermodynamic Stability for Group IV Alloy Semiconductors(<Special Issue>Novel Scientific and Technological Approaches to Group-IV Semiconductor and Alloy)
Tomonori ItoYoshihiro Kangawa
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2004 Volume 31 Issue 1 Pages 4-11

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Abstract
Thermodynamic stability of group IV alloy semiconductors such as Si_<1-x-y>Ge_xC_y solid solutions in bulk and thin film states is systematically investigated by excess energy calculations based on empirical interatomic potentials and Monte Carlo (MC) simulations. In bulk state, the calculated excess energies for Si_<1-x-y>Ge_xC_y have positive values over the entire concentration range. This implies that Si_<1-x-y>Ge_xC_y with a random distribution of Si, Ge and C is thermodynamically unstable at 0K. Furthermore, the excess energies of Si_<1-x-y>Ge_xC_y increase with Ge content x when C content y remains constant. This is because an increase of Ge content introduces large strain energy in Si_<1-x-y>Ge_xC_y. In thin film state, although lattice constraint at the interface reduces the excess energies by 20-30% of those in bulk state, we obtain similar results to those in bulk state. Further MC simulation reveals that Ge atoms segregate in the topmost layer and C atoms accumulate in the second layer. These calculated results suggest that the lattice constraint at the interface enhance the miscibility of C in Si_<1-x-y>Ge_xC_y in thin films, whereas the miscibility tends to reduce near the surface because of the segregation of Ge and C atoms.
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© 2004 The Japanese Association for Crystal Growth
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