抄録
Initial stage of film deposition has provoked a great interest, especially in physical vapor deposition (PVD). Nucleation theories have also modeled island nucleation processes during PVD. Comparing with the extensive research in PVD, there is less intension on chemical vapor deposition (CVD) despite its technological importance. In this work, we consider the characteristics of initial stage of CVD, which differs from that of PVD.
