26aD05 PLD法によるSrTiO_3(100)基板上への(K,Na)NbO_3薄膜のエピタキシャル成長(機能性結晶(1),第34回結晶成長国内会議)
2004 年 31 巻 3 号 p. 234-
詳細
2004 年 31 巻 3 号 p. 234-
KNbO_3, (K_<0.5>Na_<0.5>)NbO_3 and NaNbO_3 thin films were deposited on (100) SrTiO_3(STO) substrate by Pulsed Laser Deposition (PLD). The obtained (K,Na)NbO_3 films were epitaxially grown on (100)SrTiO_3 with an orientation relationship as (K,Na)NbO_3(001)_<pc>‖STO(001) and (K,Na)NbO_3[100]_<pc>‖STO[100]. The smoothness of the film surface is improved with the increase of the Na content.
