Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Efficient Czochralski Solar-Grade Silicon Growth(<Special Issue>Single and Multi Crystalline Silicon)
C. W. LanC. K. HsiehW. C. Hsu
Author information
JOURNAL FREE ACCESS

2005 Volume 32 Issue 4 Pages 297-305

Details
Abstract
The fast growing photovoltaic market is mainly based on crystalline silicon. The strong demand on silicon requires wafer manufacturers to produce high-quality material through high productivity processes with low cost. Therefore, to remain the competition of single crystal silicon in the solar market, highly efficient Czochralski crystal growth is required. In this paper, we discuss some of the important issues in the production of solar-grade silicon by the Czochralski method. Special focuses will be on the hot-zone design and multiple charges. The implementation of these concepts has led to significant cost reduction and yield improvement for both 6" and 8" -diameter solar-grade silicon in production. Some comments for the future development are also given.
Content from these authors
© 2005 The Japanese Association for Crystal Growth
Previous article Next article
feedback
Top