Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
CaF_2 Single Crystal for Semiconductor Lithography(<Special Issue>Crystal Growth Technology of Fluoride and Oxide Developed from the Viewpoint of Their Material and Functional Properties)
Keiji SumiyaNachimuthu SenguttuvanShigenori ShimizuMasahiro AoshimaHiroyuki Ishibashi
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2006 Volume 33 Issue 3 Pages 135-140

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Abstract
Semiconductor lithography plays an important role in miniatur-izing electronic devices with high integration, and the material which constitutes the optical system of a stepper machine serves as a critical element in determining the quality and stability in mass production of integrated circuits. CaF_2 single crystals, which excel synthetic quartz in transmittance, are the preferred lens material in such stepper machines. In this review, we report our recent work on CaF_2 crystal growth and its quality improve-ment such as reduced stress birefringence, higher refractive index homogeneity and higher laser resistance.
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© 2006 The Japanese Association for Crystal Growth
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