日本結晶成長学会誌
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
SiC溶液成長の最近の展開(<特集>SiCの現状と今後の展開)
原田 俊太山本 祐治関 和明宇治原 徹
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2013 年 40 巻 1 号 p. 25-32

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Solution growth has a potential to achieve high quality bulk SiC growth. In this paper we review current advances in SiC solution growth specially focusing on the crystal quality. During the solution growth, threading dislocations tend to be converted to basal plane defects by the step-flow of macrosteps. This phenomenon implies that all dislocations can be excluded from the lateral face of the crystal in principle. Actually, high quality SiC crystal with very low threading dislocation density was obtained applying the dislocation conversion during the solution growth.

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© 2013 日本結晶成長学会
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