主催: The Japan Society of Applied Physics
会議名: International Conference and Summer School on Advanced Silicide Technology 2014
開催地: Tokyo, Japan
開催日: 2014/07/19 - 2014/07/21
Current-perpendicular-to-plane structural Fe3Si/FeSi2/Fe3Si trilayered junctions were prepared on Si(111) by facing targets direct-current sputtering combined with a mask method. The shape of magnetization curves evidently exhibited that an antiparallel alignment is realized owing to a difference in the coercive force between the top and bottom Fe3Si layers. In addition, it was demonstrated that the antiparallel alignment in the wide range of applied magnetic field can be realized by forming a crossover structure, which is owing to an enhanced difference in the effective magnetic field between the top and bottom Fe3Si layers aligned perpendicularly to each other.