抄録
Cleaning technique to remove fine particles on a surface under dry environment is greatly wanted in manufacturing processes of LCD, functional films and so on. However, it is usually difficult to remove the fine particles by the impingement of simple airflow because the particles stick to the surface stiffly owing to the molecule force such as Van der Waals force. In this study, to remove the fine particles, a cleaning device equipped with a special air nozzle was developed. The nozzle had triangular cavities and added strong high-frequency pressure fluctuation to high-speed airflow. The wall-pressure fluctuation, airflow velocity and particle removal rate were measured using the newly developed cavity nozzle and two types of conventional straight nozzles without cavities for comparison. The measured pressure fluctuations indicated that the cavity nozzle produced the strongest fluctuation of the three nozzles, while the measured average airflow velocities of the three nozzles were almost same. The dependence of the removal rate on nozzle type and injection pressure correlates with that of the wall-pressure fluctuation rather than that of velocity turbulence. This means that the pressure fluctuation enhances particle removal.
