Analysis of Two-dimensional Contact Stresses by Interferometric Photoelasticity

抄録

An interferometric-photoelastic study has been made of inplane contact between two plates with a circular edge. An interferometric-pattern furnishes both isopachic and isochromatic fringes simultaneously which provide necessary and sufficient information for the complete determination of principal stresses σ₁ and σ₂ for the overall field. Oil immersion procedure is employed to eliminate the disturbance of the light ray due to the thickness change of the model plate and to obtain finely and properly defined fringes even in the utmost stressed region. Special emphasis of the investigation iS laid on elucidating the distribution of tangential stress σ_s (σ₁) along the contact line, particularly the value of maximum tensile stress (σ_s) t max which occurs at the end of the contact patch. The relationship between (σ_s) t max and the shape factor of the plates R₀/R with the length of contact b/R₀ as a parameter is given.