Journal of the Japan Society for Precision Engineering
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
Development of a Superconducting Magnet Assisted Hollow Cathode Plasma CVD Apparatus
Takashi NIIDOMEEOsamu OKAMOTOAtsushi HIRATAMasanori YOSHIKAWA
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1996 Volume 62 Issue 12 Pages 1757-1761

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Abstract
A magnetic field has a variety of influence on plasma so that it is applied to plasma CVD to control the state of plasma. However, the magnetic fields that have been utilized by conventional plasma CVD are limited to that of smaller than approximately 0.2T. In this study, the superconducting magnet assisted hollow cathode plasma CVD apparatus has been developed to discuss the influence of a high magnetic field of 1T on the plasma for film preparation. The characteristics of discharge were examined under magnetic fields of up to 1T, and synthesis of carbon films was carried out with methane and hydrogen gases. The results obtained are as follows : The substrate temperature rises with increasing a magnetic field that is applied to plasma; Diamond is synthesized at methane concentration of 1.5% when high magnetic field of 1T is applied to plasma.
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