粉体および粉末冶金
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
解説
レーザー援用エアロゾルデポジション法による基材の熱ダメージを抑えた電子セラミックス厚膜の熱処理プロセス
馬場 創明渡 純
著者情報
ジャーナル オープンアクセス

2009 年 56 巻 4 号 p. 177-182

詳細
抄録
Laser annealing has been conventionally used for surface treatment, sintering of structural materials and crystallization of amorphous materials. This article describes the possibility to apply laser annealing for electronic ceramics. Pb(Zr, Ti)O3 (PZT) films with a thickness of over 10 μm directly deposited onto stainless-steel substrates (PZT/SUS) by aerosol deposition (AD) technique have been annealed by infrared laser irradiation in order to improve their ferroelectric and/or piezoelectric properties. The metallic luster of the stainless-steel substrate has been retained after laser heating. The remanent polarization (Pr) and coercive field (Ec) values of the films annealed by laser irradiation was Pr > 40 μC/cm2 and Ec < 40 kV/cm, respectively, being superior to those of the PZT/SUS annealed by electric furnace. The area of grain growth for the irradiated PZT films coincides with the fascicle spot size. In contrast, in the case of bulk PZT, infrared laser irradiation with the same spot size is causing grain growth on a larger area (20 times the spot diameter). The combination of laser annealing and AD technique is attractive not only for production of electronic ceramics devices but also to confirm to heat treatment of electronic ceramics to the desired areas.
著者関連情報
© 2009 一般社団法人粉体粉末冶金協会

本論文はCC BY-NC-NDライセンスによって許諾されています.ライセンスの内容を知りたい方は,https://creativecommons.org/licenses/by-nc-nd/4.0/deed.jaでご確認ください.
https://creativecommons.org/licenses/by-nc-nd/4.0/deed.ja
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