研究論文
レーザーCVD法によるTiO2膜の歯科材料への応用
キーワード:
laser chemical vapor deposition (LCVD),
TiO2 film,
coating,
osseointegration,
cell attachment
2016 年 63 巻 3 号 p. 128-131
詳細
2016 年 63 巻 3 号 p. 128-131
TiO2 is widely used in dental materials as orthopedic and dental implant thanks to its good properties and biocompatibility. Rutile- and anatase-type TiO2 films were prepared by laser chemical vapor deposition using Nd:YAG laser. The TiO2 films showed cauliflower like microstructures at laser power of 160 W. The highest deposition rate was 17.1 μm/h at the total pressure of 800 Pa. Rutile- and anatase-type TiO2 was formed at the total pressure of 210 Pa, anatase-type at 800 Pa and rutile-type at 1500 Pa. The degree of osseointegration in the early stages is critical for determining the mechanical stability of the implant. The cell attachment behaviors of TiO2 films, in particular, the cell density and aspect ratio of osteoblast cells on TiO2 films were evaluated. Microstructure of the surface and photocatalytic performance of anatase-type TiO2 may be effective for cell attachment.
