Hydrogen Reactive Sputtered a-C:H Thin Films doped with Various Metals

Abstract

Some metals, B, P, and Al etc., introduced to a-C : H films prepared by hydrogen reactive sputtering were investigated for dopants applicable to a-C : H films from temperature dependencies of surface electrical resistivity.
Phosphorus and aluminum were appropriate for dopants since they showed reciprocal temperature dependencies of resistivity, while boron did not showed it on a-C : H deposited below 100°C.