粉体および粉末冶金
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
イオン照射によるセラミックスの開発
野田 正治日置 辰視土井 晴夫
著者情報
ジャーナル オープンアクセス

1990 年 37 巻 2 号 p. 245-252

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抄録
High energy ion irradiation is an emergent process to modify materials surface. This irradiation results in implantation of foreign atoms as well as many displacements of atoms in a materials surface layer at low temperatures at which the diffusion of atoms is limited. So, the ion irradiation often generates metastable amorphous phase in the surface layer. The ion irradaition also generates high residual compressive stress in the surface layer. The amorphous layer and the compressively stressed layer are demonstrated to be beneficial to improvement of mechanical properties of ceramics. Ion beam mixing also causes improvement of adhesion strength of a metal thin film on ceramics. Ion beam mixed ceramics are found to have high resistivity against abrasive wear.
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© 社団法人粉体粉末冶金協会

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