Abstract
Thin films of cobalt-cobalt oxide were prepared by reactive evaporation, and their magnetic properties were measured. The perpendicular magnetic anisotropy of the films were changed by the oxygen pressure and deposition rate. When the deposition rate was kept constant, the content of cobalt oxide in the film increased and a perpendicular magnetic anisotropy appeared with increasing oxygen pressure. The deposition rate also affected the content of cobalt oxide in the films because the number of the collisions between cobalt and oxygen molecules on the substrate changed. The films deposited at high deposition rate tended to have a longitudial magnetic anisotropy in spit of the high ratio of oxide in the films.
