粉体および粉末冶金
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
ガラス及びサファイアへのイオン注入による酸化物微粒子の生成
池山 雅美中尾 節男宮川 草児宮川 佳子丹羽 博昭種村 誠太斎藤 和雄
著者情報
ジャーナル オープンアクセス

1998 年 45 巻 12 号 p. 1216-1219

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抄録
Using double ion species implantation of metal and oxygen ions, we have examined the possibility of synthesis of metal-oxide fine particles in glass or sapphire surface. Characteristics of ion implanted silica glass and sapphire were examined by RBS, XRD and optical (absorption and photo-luminescence) measurements. 1.8 MeV 1×1017 Cu+/cm2 implantation into silica glass and a successive heat treatment of 1000°, 1h in the air can make Cu fine particles. 1.8 MeV 1×1017 Cu+/cm2 and 1.0 MeV 1×1017 O+/cm2 implantation into silica glass and the successive heat treatment can synthesis Cu2O fine particles of about 8 nm in radius. 1.8 MeV 5×1016 Ti+/cm2 and 1.0 MeV 1×1017 O+/cm2 into sapphire and the successive heat treatment can synthesis Ti02 fine particles of about 10 nm in radius. The TiO2 particles were rutile-type with (200) orientation, which may be related to the (0001) orientation of sapphire substrate. Luminescence from defects in sapphire substrate was observed, but luminescence from the particles could not be detected.
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© 社団法人粉体粉末冶金協会

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