Abstract
The present paper describes synthesis techniques of ferrite thin films by the facing-targets sputtering and the ferrite-plating methods. The difference in microstructure, crystallinity and magnetic properties of the ferrite films deposited by the two deposition methods is caused by the difference in energy which atoms and ions have in order to migrate on and around substrates. Co-M ferrite films (M=Zn, Ni) deposited by the two methods for magnetic recording media were investigated. Since the sputtered atoms have higher migration energy than the plating ions, the sputter-deposited Co-Zn ferrite films exhibited closely packed finer microstructure, better crystallinity, and higher mechanical strength. Co-Ni ferrite-plated films had excellent perpendicular magnetic anisotropy though the microstructure must be improved to apply to the magnetic recording media. The ferrite plating has the advantages in coating micrometersize particles used as magnetically separable carriers such as for medical applications because it is a wet process.
