日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
磁気光学
2インチ径Nd3Ga5O12基板上のBiGdガーネット厚膜の育成と評価
石川 武正日比谷 孟俊小野 賢悟白木 健一
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1986 年 10 巻 2 号 p. 147-150

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Two inch diameter, 300 μm thick (BiGd)3(FeGaAl)5O12 films with a mirror surface were grown on {111} Nd3Ga5O12 substrates by liquid phase epitaxy. The extinction ratio was measured for a 30 × 18 mm2 specimen cut from a two inch diameter wafer. A ratio of 37 ± 3dB was obtained throughout the specimen. Several swirl patterns were observed at the periphery of the grown films. The swirl consists of a pit followed by a shallow groove, and was revealed to be caused by a shallow pit corresponding to the defect of NdGG substrate. Degradation of the extinction ratio was found at the pit of the swirl.
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© 1986 (社)日本応用磁気学会
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