抄録
Dependence of perpendicular anisotropy of continuously vacuum deposited Co-Cr films on glow discharge treatment of polymer film surface and on thickness of Ti underlayers was investigated. The relation between the microstructure and the recording characteristics of the Co-Cr films was also studied. When the polymer film surface was pretreated by glow discharge with Ar gas, Hkeff of the Co-Cr films decreased. On the other hand, using H2 gas instead of Ar gas, deterioration of Hkeff was negligible. The Co-Cr films deposited on the Ti underlayers had high Hkeff independent of the condition of the glow discharge treatment. Thickness of the Ti underlayers had to be more than 40Å in order for the Co-Cr films to have small Δθ50 such as 5-6°. Columnar structure of the Co-Cr films appeared when thickness of the Ti underlayers was in the range of 100-2000Å. The Co-Cr films consisting of columnar structure yielded high reproduced voltage.
