Magnetic Properties and Microstructure of Electroless Plated Co-Ni-P-W-Mn thin films for Perpendicular Recording

抄録

  Effects of the bath composition and plating conditions on the magnetic properties and crystal orientation of Co-Ni-P-Mn-W films were studied. The composition of the bath was similar to the one proposed by Osaka[1]. However, modification was done by addition of Na₂WO₄, increasing NiSO₄ concentration and decreasing NaH₂PO₄ concentration. The thin films with Ms of 700-900 emu/cc, Hc(⊥) of 500-600 Oe, Hc(//) of 300-400 Oe and Hk_eff of 3-3.5 KOe were obtained by increasing Ni content in the film. Columnar growth of hcp structure with good (002) axis alignment was found even when Ni content was above 45%. Stability of the hcp phase attained by rapid quenching of 50% Co-50% Ni melt was examined after postannealing treatment.