THERMAL DIFFUSION OF Co AND Cr IN Co/Cr MULTILAYERS

抄録

  Co/Cr multilayered films deposited on glass substrates by rf magnetron sputtering have been annealed in 300°C and 500°C in vacuum. The intensities of satellite peaks decrease and disappear with annealing. In correspondence with the decrease in the satellite peak intensity, the magnetization per Co volume, M_Co, decreases with annealing. We have calculated the time dependence of the decrease in M_Co by assuming the interdiffusion of Co and Cr at the layer boundaries, and have estimated the coefficients of the interdiffusion of Co and Cr. The activation energy for the diffusion is estimated as 0.2∼0.5 eV, and this value suggests that the diffusion occurs due to the grain boundary diffusion. The RBS profiles of the Co/Cr double layers have been investigated after annealed at 500°C and they indicate that Cr is faster to diffuse into Co layer than Co into Cr layer.