日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
磁性体物理
FeRh合金薄膜の再結晶過程と磁気相転移
大谷 佳光吉村 文一
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ジャーナル オープンアクセス

1995 年 19 巻 2 号 p. 237-240

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抄録
The recrystallization process in Fe51.2Rh48.8 thin films was studied to clarify the relationship between the film microstructure and the magnetic transition. It was found that high-temperature annealing results in grain growth and a plate-like structure. The transition temperature and the thermal hysteresis width decrease from 70 to 10°C and from 140 to 3°C, respectively, as the annealing temperature increases from 600 to 1200°C. The film annealed at 1200°C exhibits complete ferromagnetic-to-antiferromagnetic transition as bulk FeRh alloy does. The thin plate-like structure and the lattice distortion strongly affect the thermal hysteresis. It was found that the stress release mechanism is closely related to the thin plate martensitic transformation.
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© 1995 (社)日本応用磁気学会
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