日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
ソフト材料
多層化による Fe-Si/Cr エピタキシャル膜の高透磁率化
八重樫 誠司栗原 敏也佐藤 和幸
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ジャーナル オープンアクセス

1997 年 21 巻 4_2 号 p. 581-584

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抄録
Epitaxial Fe-7.2 wt%Si (111) monolayer films and Fe-Si (111)/Cr (111) multilayer films were prepared on Si (111) substrates by facing-targets sputtering. Excellent soft magnetic properties were obtained in monolayer films with a thickness of less than 200 nm, and Fe-Si (111)/Cr (111) multilayer films with a Cr layer thickness of 20 nm. Torque measurements of the monolayer and multilayer films showed that an anomalous increase in the effective anisotropy energy caused a deterioration in the soft magnetic characteristics.
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© 1997 (社)日本応用磁気学会
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