Abstract
A contact SCC-MIG head with three contact pads was prepare by using the dry etching process, and its read/write performance was evaluated. The magnetic spacing of the contact system was estimated to be about 30 nm and the bouncing height was 10 nm. A D50 of 250 kFCI was achieved by using a gap length of 0.10 μm and a track width of 1.2 μm. The read/write performance can be theoretically improved by reducing the overcoat thickness and/or optimizing the magnetic properties of the medium. Regarding the gap length dependence, the read/write performance was significantly improved by using a small gap length in applications involving narrow magnetic spacing, such as contact recording.