日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
計測・磁気応用
高電気抵抗Fe(Co-Fe)-Hf-O磁性薄膜リアクトルの磁気特性とチップサイズの関係について
大角 英俊佐藤 敏郎山沢 清人畑内 隆史牧野 彰宏
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ジャーナル オープンアクセス

1998 年 22 巻 4_2 号 p. 873-876

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抄録
The chipsize dependence of the magnetic characteristics of thin-film reactors using nanocrystalline Fe (Co-Fe)-Hf-O magnetic films with a high resistivity is discussed by using the finite element method in which a linear magnetization of the thin-film is asssumed. The inductance of the reactors is proportional to the 3rd power of the reactor-size W. The loss-equivalent resistances of the film and the coil-conductor are proportional to the 4th and 2nd powers of W, respectively. The iron loss of the reactors is very small, and show a high value of the quality factor at a high frequency region.
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© 1998 (社)日本応用磁気学会
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