抄録
Preparation of writing-head cores by the electroless plating method was investigated. Electroless CoFeB plating has poor selectivity of deposition onto a patterned surface; that is, film deposition occurred not only on the catalytic surface but also on the photoresist, which had no catalyst. To improve the selectivity of electroless CoFeB plating, the effects of agitation and additives were investigated. Deposition onto the photoresist was decreased by agitation, but was still observed. Some organic additives were found to inhibit deposition onto the photoresist, and CoFeB plating from a bath including that additive had good selectivity. By combining of these two methods, it may be possible to obtain coherent deposition onto the patterned surface of a writing-head core.
