抄録
Ni-Fe / Mn-Ni bilayers were fabricated at room temperature on MgO{100} and MgO{110} single-crystal substrates by the facing-targets dc sputtering method. The Ni-Fe layer was deposited by applying a bias voltage. After the deposition of the Ni-Fe layer, an Mn-Ni layer was deposited on the Ni-Fe layer. The Ni-Fe and γ-Mn-Ni layers were grown by epitaxy and highly oriented in their crystal axes in the film plane. In the case of the MgO{100} substrate, the preferred orientations of Ni-Fe and γ-Mn-Ni were (001), and the directions of Ni-Fe[100] and γ-Mn-Ni[100] were parallel to MgO[100]. The crystal structure of γ-Mn-Ni was fct, and c/a decreased from 1.01 to 0.984 when the Mn-Ni layer thickness increased from 200 to 1000 Å. In the case of the MgO{110} substrate, the preferred orientations of Ni-Fe and γ-Mn-Ni were (110), and the directions of Ni-Fe[001] and γ-Mn-Ni[001] were parallel to the direction of MgO[001]. The crystal structure of γ-Mn-Ni was fct (c/a = 0.978).
