Thermal Reactions of Thin Film of Trilinoleoylglycerol on Plate of Iron and Silica under Nitrogen
1994 Volume 43 Issue 12 Pages 1075-1080
Details
1994 Volume 43 Issue 12 Pages 1075-1080
The thermal polymerization and degradation of thin films of trilinoleoylglycerol (TLG) (thickness 85 μm) on a iron cell plate (Fe cell) and silica cell plate (SiO2 cell) under nitrogen were investigated by vacuum thermal gravimetric analysis (VTGA) using dynamic thermal programs.
The results obtained are as follows.
1) The thermal polymerization of thin films of TLG in the Fe and SiO2 cell was started at 160 °C and the rates of the reactions were quite rapid at 230°C and 250°C under nitrogen respectively.
2) The rate constants and apparent activation energy of the thermal polymerization of TLG in the Fe cell were 1.23 × 10-3 -2.40 × 10-3 wt %/s and 11 kcal/mol in temperature ranges of 200°C to 230°C, and 2.40 × 10-3 -8.75 × 10-3 wt %/s and 33 kcal/mol of 230°C to 250°C, respectively. For TLG on the SiO2 cell, these parameters were 2.22 × 10-4 -6.94 ×10-4 wt %/s and 53 kcal/mol from 160 °C to 250°C, and 6.94 ×10-4 -24.1 × 10-4 wt %/s and 126 kcal/mol of 250°C to 270°C, respectively.
3) The thermal decomposition of thin films of TLG on the Fe and SiO2 cells were initiated at 220°C and 240°C, respectively. The reaction rates were very fast at 240°C and 270°C under nitrogen, respectively.
